Photolithography technology refers to the technology of transferring the pattern on the mask plate to the substrate with the help of photoresist under the action of light (generally ultraviolet light, deep ultraviolet light, extreme ultraviolet light). The photolithography technology is one of the most important processes in semiconductor manufacturing.
The main technologies of flat panel display include: liquid crystal display (LCD, generally divided into TN/STN/TFT three types), plasma display (PDP), organic light emitting diode display (OLED), field emission display. Among them, TFT-LCD is the current mainstream flat panel display, and its process is relatively mature. Taking the whole process of TFT-LCD as an example, it is subdivided into: array technology, color film (CF technology), cell technology and module technology.
Chemical Mechanical Planarization(CMP) is a polishing technology used to manufacture semiconductor industrial wafers and is a technology in semiconductor device manufacturing process. It uses chemical corrosion and mechanical force to planarize silicon wafers or other substrate materials during machining. Chemical mechanical polishing solutions improve the process of creating multi-layer semiconductor circuits. Among them, the chemical polishing paste we generally called grinding liquid slurry.
Ultra-clean and high purity reagents used in the microelectronics industry are commonly known as process chemicals internationally, and are called wet chemicals in the United States, Europe and Taiwan, China. They are one of the indispensable chemical materials in the process of micro-fabrication of electronic technology and are used for chip cleaning and etching.